Chinese translation for "光刻机"
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- lithography machine
photoetching machine
Related Translations:
光刻: [物理学] photoetching◇光刻材料 photoetching material; 光刻工艺 photoetching technology; 光刻技术 photoetching technique; photetch 精密光刻: precision photolithography 光刻技术: lithographyphotetchphotoetching technique 光刻材料: photoetching material 投影光刻: projection alignmentprojection lithographyprojection markingprojection printing 光刻极限: photolithography limitation 电子束光刻: beamwriter lithographyelectron beam lithography
- Example Sentences:
| 1. | Aligner proximity type
接近式光刻机 | | 2. | The wafer processing system is an important subsystem of the lithography , which consists of a wafer transmission system and a wafer pre - alignment system
晶圆处理系统是光刻机的重要组成子系统,其包含两个主要部分:晶圆传输系统和晶圆预对准系统。 | | 3. | How to use the measured effective diffusion length and scanner illumination condition to demonstrate photolithography line width uniformity is introduced
摘要介绍了如何通过测量得出的等效扩散长度和光刻机的照明条件来对任何光刻工艺的线宽均匀性进行评估。 | | 4. | To predict lithographic results well for opc purpose , a fast , practical and efficient lithographic model , which is suitable for opc processing of complicated 1c layouts , is becoming an important research topic
因此，一种能满足版图opc处理软件要求的，快速、实用而又足够精确的光刻机光学系统模型就成为一个重要的研究课题。 | | 5. | The lithography is an important device for the microelectronics manufacturing , it is one of the key technologies to drive the ic manufacturing forward and it is widely used in the fields such as electronic encapsulation , photo - electricity equipment , detector , mems equipment , display and so on
21世纪,微电子技术仍然是信息产业的主要技术支撑之一,光刻机是微电子器件制造业的重要工具。光刻技术一直是推动集成电路( ic )制造业向前发展的关键技术之一。广泛应用于电子封装,光电设备,探测器, mems设备,显示器等领域。 | | 6. | The basics of lithography process , as well as the basic structure of lithographic system and the basic theory of partially coherent imaging are introduced in this paper . a bi - linear model of optical imaging is also presented . based on these theories , the simulation process of csplat is particularly analyzed , especially the computation of tccs ( transmission cross coefficient ) under different illuminations and the processing of primary lens aberrations inside tcc computation process
本文从光刻基本过程入手，介绍了光刻机光学系统的基本组成、部分相干光透射成像的基本原理，提出了光学系统的双线性模型，并在此基础上详细分析了仿真软件splat的仿真过程，其中着重分析了光学系统的传输交叉系数tcc的计算，包括不同照明系统下tcc的计算以及tcc计算中像差的处理。 | | 7. | Combining magnetic levitation technology and linear motor drive technology , applying cad / cae method , a new magnetic levitation precise stage is designed and researched , which is step and precise position mechanism in 1c chip manufacture equipment of micro - electronics trade such as laser photolithography equipment . it is an innovative research
将磁悬浮技术和直线驱动技术相结合，采用cad cae技术手段设计研究了一种新型磁悬浮精密定位工作台，它是针对微电子行业ic芯片制造设备如光刻机而研制的快速步进、精密定位机构，是创新性研究。 |
- Similar Words：
- "光刻法" Chinese translation, "光刻法；照相平板印刷" Chinese translation, "光刻法的" Chinese translation, "光刻干工艺" Chinese translation, "光刻工艺" Chinese translation, "光刻极限" Chinese translation, "光刻技术" Chinese translation, "光刻胶" Chinese translation, "光刻胶剥离" Chinese translation, "光刻胶层图像形成" Chinese translation
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