Chinese translation for "光刻极限"
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- photolithography limitation
Related Translations:
光刻: [物理学] photoetching◇光刻材料 photoetching material; 光刻工艺 photoetching technology; 光刻技术 photoetching technique; photetch 精密光刻: precision photolithography 光刻技术: lithographyphotetchphotoetching technique 光刻材料: photoetching material 投影光刻: projection alignmentprojection lithographyprojection markingprojection printing 电子束光刻: beamwriter lithographyelectron beam lithography 光刻工艺: photoetching technologyphotolithographic process
- Example Sentences:
| 1. | Interferometirc lithographic technology incorporates laser , interference optics , diffraction optics and optical lithography and it is a frontier research subject in microfabrication technology and microelectronic field sponserd by national natural science foundation of china . the research for this technology in theory , simulation and experiments has important scientific meanings and broad application prospect for promoting lithographic limit , developing nanometer electronic and photoelectron devices , novel large screen panel display and novel lithographic equipment of our country 干涉光刻技术集激光、干涉和衍射光学及光学光刻于一体,是国家自然科学基金资助的微细加工技术和微电子领域的前沿研究课题,对其进行理论、模拟和实验研究,对推进光学光刻极限,发展我国纳米微电子和光电子器件、新型大屏幕平板显示器和新型光刻机具有重要的科学意义和广阔的应用前景。 |
- Similar Words:
- "光刻法;照相平板印刷" Chinese translation, "光刻法的" Chinese translation, "光刻干工艺" Chinese translation, "光刻工艺" Chinese translation, "光刻机" Chinese translation, "光刻技术" Chinese translation, "光刻胶" Chinese translation, "光刻胶剥离" Chinese translation, "光刻胶层图像形成" Chinese translation, "光刻胶断面图" Chinese translation
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