| 1. | Electron-beam lithography with a novel multilevel resist structure defines the pattern .
采用新型的多层抗蚀剂结构的电子束光刻来形成图形。 |
| 2. | Lithography, as used in the manufacture of ics, is the process of transferring geometic shapes on a mask to the surface of a silicon wafer .
光刻技术应用到集成电路制造中，就是将掩模版的几何图形转移到硅片表面的工艺过程。 |
| 3. | Analysis of nanometrology and atom photolithography
纳米计量与原子光刻技术分析 |
| 4. | The prospect for the maskless lithography technology
无掩模光刻技术的前景 |
| 5. | It also can give accurate figure
光刻线条均匀、一致，可以有效控制图形。 |
| 6. | Recent progress in photolithography technology
光刻技术及其新进展 |
| 7. | Factors of affecting patterning quality in holographic lithography
影响全息光刻图形质量的因素 |
| 8. | Lithography - the process used to transfer patterns onto wafers
光刻-从掩膜到圆片转移的过程。 |
| 9. | Fabrication technology of microlens array by melting photoresist
微透镜阵列的光刻胶热熔制作技术 |
| 10. | Evaluating safelights for photoresists
光刻胶安全灯的评价 |
