Chinese translation for "光刻胶"
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- optical resist
photosensitive resist
Related Translations:
光刻: [物理学] photoetching◇光刻材料 photoetching material; 光刻工艺 photoetching technology; 光刻技术 photoetching technique; photetch 精密光刻: precision photolithography 光刻技术: lithographyphotetchphotoetching technique 光刻材料: photoetching material 投影光刻: projection alignmentprojection lithographyprojection markingprojection printing 光刻极限: photolithography limitation 电子束光刻: beamwriter lithographyelectron beam lithography
- Example Sentences:
| 1. | Fabrication technology of microlens array by melting photoresist 微透镜阵列的光刻胶热熔制作技术 | | 2. | Evaluating safelights for photoresists 光刻胶安全灯的评价 | | 3. | X ray resist x 射线光刻胶 | | 4. | Actuality and development of ultra - clean and high pure chemical reagents and photoresists in china 我国超净高纯试剂和光刻胶的现状与发展 | | 5. | By digitization , we optimize the intensity data of the incidence beam at the vicinity of start point and end point . 3 通过选择合适的涂胶参数,在凹透镜表面上进行了薄光刻胶胶层的均匀涂布。 | | 6. | Alignment insures that a new pattern being added to a wafer is aligned to the previous pattern or patterns on the wafer 对准之后,当照射光通过掩模的透明区域时,晶片上对辐射敏感的光刻胶曝光。 | | 7. | With the third harmonic 355nm nd : yag laser as the exposal source , the lithography of su - 8 photoresist is studied 本文采用波长为355nm的三倍频nd : yag激光作为曝光光源,对su - 8光刻胶进行光刻研究。 | | 8. | In microelectronics , the process of removing material , on a chip , left exposed by the exposure and development of the photoresist 在微电子技术中,通过曝光并显影光刻胶除去芯片上的物质露出剩馀部分的工艺。 | | 9. | Lin h , li l and zeng l . , " in - situ end - point detection during ion - beam etching of multilayer dielectric gratings " , chin . opt . lett . , 3 ( 2 ) , 63 ( 2005 ) 林华, "介质膜光栅:光刻胶掩模占宽比和离子束刻蚀槽深的监控" ,博士论文,导师:李立峰( 2006 ) | | 10. | We demonstrate experimentally the technique to fabricate large does in the thick film on a concave lens ( mirrors ) surface with precise alignment by using the strategy of exposure twice 采用两次曝光的方法在凹透镜表面上厚光刻胶中制作衍射光学元件。 |
- Similar Words:
- "光刻干工艺" Chinese translation, "光刻工艺" Chinese translation, "光刻机" Chinese translation, "光刻极限" Chinese translation, "光刻技术" Chinese translation, "光刻胶剥离" Chinese translation, "光刻胶层图像形成" Chinese translation, "光刻胶断面图" Chinese translation, "光刻胶附着" Chinese translation, "光刻胶干式剥除" Chinese translation
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