| 1. | Preparation of polycrystal target material of la0 . 5sr0 . 5coo
3多晶靶材的制备研究 |
| 2. | The results show that the performance of target is excellent
在薄膜溅射前,成功制备出溅射用靶材。 |
| 3. | Development of cylindrical rotating magnetrons with high target utilization rate
高靶材利用率的新型磁控溅射器 |
| 4. | : mainly used in ito target , alloy and photoelectricity components
：主要用于制作ito靶材、合金及光电元器件等。 |
| 5. | Simulation of energy absorbed by target with intense pulsed ion beam model
强流脉冲离子束模型及辐照靶材能量沉积的模拟研究 |
| 6. | The erosion failure and plug failure of target are the main character under this condition
靶材发生侵蚀破坏和冲塞型破坏。 |
| 7. | Aluminum alloy films and sputtering targets for semiconductor integrated circuit wiring and electrodes
集成电路电极布线用铝合金薄膜及其溅射靶材 |
| 8. | Target material was hexagonal boron nitride ( hbn ) and working gas was pure argon
用射频溅射法在si衬底上制备立方氮化硼，靶材为hbn ， 。工作气体为氩气。 |
| 9. | Development and mass production of targets for lcd - tft and for dielectric layer in optical data storage application
介电层靶材升级与显示器靶材之开发与量产化 |
| 10. | Manufactures and fabricates high quality cadmium telluride , cadmium zinc telluride and related single crystal substrates
-主要从事光电晶体系列材料溅射靶材的制备和光学元器件研发与生产。 |
