| 1. | The preparation and properties of cdte polycrystalline films for solar cells
多晶薄膜沉积制备及其性能 |
| 2. | During depositing , the matrix temperature increases , the crystal grain grows and the grain size increases
薄膜沉积过程中，基片温度升高，晶粒生长，薄膜晶粒尺寸增大。 |
| 3. | We studied the relationship of pressure , flux of sih4 and substrate temperature with deposition rate of a - si : h films
我们研究了工作气压、 sih _ 4气体流量和衬底温度等工艺条件与a - si : h薄膜沉积速率的关系。 |
| 4. | The mechanism of affecting the deposition rate of a - si : h , was very perplexing , and had close relation with preparing methods
影响a - si : h薄膜沉积速率的机制非常复杂，这些机制与制备工艺条件有着密切的联系。 |
| 5. | When the depositing time becomes very long , the equipment will probably be damaged , therefore , the depositing time was controlled in 25 minutes
但由于考虑设备寿命等因素，薄膜沉积时间短，膜层比较薄，光催化性能很差。 |
| 6. | In order to produce low scatter optics , it is essential that the manufacturer have a way to measure the roughness and feed this information back into the polishing process
一是薄膜沉积过程中固有的粗糙度；二是继承下一层界面的粗糙度。 |
| 7. | The theory and structure of pecvd system are introduced , sio _ 2 films with different parameters are deposited on si substrates
阐述了用pecvd技术制备硅基sio _ 2光波导薄膜材料的基本原理、设备结构和实验的基本工艺流程,采用不同的实验参数进行了薄膜沉积。 |
| 8. | Among the manufacture processes , this thesis focuses on the deposition of silica waveguidi film with a plasma enhanced chemical vapor deposition ( pecvd )
最后本文实现了器件样品的制作。器件制作的工艺流程中本文重点研究了基于半导体技术的二氧化硅薄膜沉积技术。 |
| 9. | We studied the effect of mirror magnetic field to deposition rate and homogeneity in large area , moreover , gained large - area homogeneous films at high deposition rate
研究了磁镜磁场对薄膜沉积速率及均匀性的影响，并且在实验中得到了高沉积速率、大面积均匀的a - si : h薄膜。 |
| 10. | We study the formation mechanism of semiconductor grains from the aspect of the thermodynamics and the dynamics of the grains and the chemistry reaction in the films
从溅射薄膜沉积时或退火处理时的薄膜中颗粒的热力学和动力学的角度以及是否存在化学反应对半导体颗粒的形成机理做了进一步的探讨。 |
