| 1. | General specification for magnetic sputtering equipment
磁控溅射设备通用技术条件 |
| 2. | Magnetron enhanced reactive ion etaching system
磁控管增强型反应性离子蚀刻系统 |
| 3. | Blank detail specification for continuous wave magnetrons
连续波磁控管空白详细规范 |
| 4. | Techniques of clinical linac magnetron replacement
医用直线加速器磁控管更换技术探讨 |
| 5. | Research of unbalanced magnetron sputtering system
非平衡磁控溅射系统的研究 |
| 6. | Blank detail specifications for pulsed magnetrons
脉冲磁控管空白详细规范 |
| 7. | To discuss the technological project of setting up many ethernets
磁控溅射真空制膜技术 |
| 8. | Electronical pressure switch magswitch with integrated led
磁控电子压力开关，集成了led |
| 9. | Detail specification for coail magnetron of type ckm - 2936
Ckm - 2936型同轴磁控管详细规范 |
| 10. | Detail specification for pulse magnetron of type ckm - 6951
Ckm - 6951型脉冲磁控管详细规范 |
