Sims measuring widths of interfaces in sputter depth profiling using sims 用次级离子质谱法
2.
Surface chemical analysis - secondary - ion mass spectrometry - determination of relative sensitivity factors from ion - implanted reference materials 表面化学分析.次级离子质谱法.测定离子注入标样的相对灵敏系数
3.
Surface chemical analysis - secondary ion mass spectrometry - determination of boron atomic concentration in silicon using uniformly doped materials 表面化学分析.次级离子质谱法.利用均匀掺杂材料测定硅中硼原子浓度
4.
Surface chemical analysis - secondary - ion mass spectrometry - method for estimating depth resolution parameters with multiple delta - layer reference materials 表面化学分析.次级离子质谱法.多层标准材料深度溶解参数的估算方法
