| 1. | The mask acts as a low frequency spatial filter whose effect is to enhance rendition of fine detail .
掩模就象一个低频空间滤波器，其效果是增强细节的重现。 |
| 2. | Lithography, as used in the manufacture of ics, is the process of transferring geometic shapes on a mask to the surface of a silicon wafer .
光刻技术应用到集成电路制造中，就是将掩模版的几何图形转移到硅片表面的工艺过程。 |
| 3. | Specification for round quartz photomask substrates
圆形石英玻璃光掩模基板规范 |
| 4. | The prospect for the maskless lithography technology
无掩模光刻技术的前景 |
| 5. | Test methods of mask alignment and exposure system
掩模对准曝光机测试方法 |
| 6. | Specification for registration marks for photomasks
光掩模对准标记规范 |
| 7. | Act of moving a mask or reticle to match up alignment marks
对准,调整掩模和晶片之间的位置。 |
| 8. | Chrome thin films for hard surface photomasks
硬面光掩模用铬薄膜 |
| 9. | Guidelines for photomask defect classification and size definition
光掩模缺陷分类和尺寸定义的准则 |
| 10. | Fabrication of continuous relief mask for diffractive plane focus lens
连续型平面衍射聚光透镜掩模的制作 |
