| 1. | Microwave plasma emission spectrometridetector
微波等离子体发射光谱检测器 |
| 2. | Microwave inductive plasma emission spectrometer mip
微波等离子体光谱仪 |
| 3. | Microwave inductive plasma emission spectrometer
微波等离子体光谱仪 |
| 4. | Experimental and numerical studies on 0 . 1 kw microwave plasma thruster
微波等离子体推力器的试验与数值研究 |
| 5. | Microwave plasma detector
微波等离子体检测器 |
| 6. | Effect of microwave plasma etching decarburization onadhesive strength and cutting performance of cvd diamond coated tools
微波等离子体刻蚀处理对金刚石薄膜涂层刀具附着力和切削性能的影响 |
| 7. | The plasma batch system 300 is a compact microwave plasma batch system for resist ashing and wafer cleaning in semiconductor applications
微波等离子体300是一个简洁的微波等离子，主要应用于半导体方面的灰烬消除和晶片清洁。 |
| 8. | In this work , cemented carbide ( wc - co ) was used as a kind of depositional substrate and diamond was deposited upon it in an mpcvd equipment
本研究中，用自行研制的微波等离子体化学气相沉积( mpcvd )装置对在硬质合金基体上金刚石的涂层进行了研究。 |
| 9. | Plasma systems 400 and 660 are low - pressure microwave plasma systems for cleaning advanced chip packages prior to die attach , wire bond and encapsulation
等离子体400和660系列是低压微波等离子体应用于提高模具粘合，引线的焊接，特别是清洗高级的芯片封装。 |
| 10. | Recently mwpcvd ( microwave plasmas chemical vapor deposition ) technique has attracted more and more attentions of the researchers all over the world , it is a new produce technique
近年来微波等离子体化学气相沉积技术越来越受到人们的关注,它是一种新型的生产技术。 |
