等离子体刻蚀 meaning in Chinese
plasma etch
Examples
- Influence of process parameters on the etching rate in inductively coupled plasma etcher
等离子体刻蚀中工艺参数对刻蚀速率影响的研究 - Hardware and software design for the inductively coupled plasma etching machine " s system are also presented
介绍了plc控制等离子体刻蚀机的硬件系统和软件系统的设计。 - Effect of microwave plasma etching decarburization onadhesive strength and cutting performance of cvd diamond coated tools
微波等离子体刻蚀处理对金刚石薄膜涂层刀具附着力和切削性能的影响 - Via the experiment , the best etching process of etching insb - in material with chclfi plasma is confirmed . and the mechanism is also analyzed and discussed
通过实验确定该条件下chclf _ 2等离子体刻蚀insb - in的最佳工艺，并分析探讨chclf _ 2等离子体刻蚀insb - in薄膜的机理。 - Finally , according to the technique of plasma etching , an evolution model describing the spatio - temporal profiles of the micro - trench is established . and that we simulated the effects of collisions and the source parameters on the etching profiles
最后，针对等离子体刻蚀工艺，建立了微结构区剖面的时空演化模型，并模拟了碰撞效应和电源参数对刻蚀剖面演化的影响。