溅射靶 meaning in Chinese
sputtering target
Examples
- Magnetron sputtering target source and sputtering procedure
磁控溅射靶源设计及溅射工艺研究 - Aluminum alloy films and sputtering targets for semiconductor integrated circuit wiring and electrodes
集成电路电极布线用铝合金薄膜及其溅射靶材 - Manufactures and fabricates high quality cadmium telluride , cadmium zinc telluride and related single crystal substrates
-主要从事光电晶体系列材料溅射靶材的制备和光学元器件研发与生产。 - It make possible for the system to set and to change source current ( which is proportional to evaporation rate from the ms source ) during coating process
在镀膜过程中，保证了每个磁控溅射靶上电流的稳定控制和精确调整。 - Uniform and compact plzt and sno _ 2 ceramic targets , which diameter were 212mm and 221mm , respectively , had been successfully fabricated . ( 2 ) a rotating magnetic field rf magnetron sputtering system had been designed and set up , which showed high utilization efficiency of target , high films uniformity , and high deposition rate , etc . ( 3 ) the plzt and sno _ 2 thin films were investigated by afm , xrd , sem , and spectral photometer . the optimized processing parameters of preparing these films had been found
并以此为基础分别制备了致密、均匀、平整、直径为212mm的plzt和221mm的sno _ 2陶瓷溅射靶材; ( 2 )为克服现有磁控溅射设备的不足,提出了一种新的磁控溅射方案,采用该方案的设备具有:靶材利用率高、镀膜均匀、成膜速度快等特点; ( 3 )运用afm 、 xrd 、 sem以及双光路分光光度计等分析手段对plzt和sno _ 2薄膜的微结构和性能进行研究,找到了制备plzt电光薄膜和sno2透明电极材料的最佳工艺条件。