溅射薄膜 meaning in Chinese
thin sputtered film
Examples
- The sputtered thin film strain gauge technology provides excellent stability and a high burst pressure rating
溅射薄膜应变测量技术为我们提供了良好的稳定性和很高的破坏额定压力值。 - We study the formation mechanism of semiconductor grains from the aspect of the thermodynamics and the dynamics of the grains and the chemistry reaction in the films
从溅射薄膜沉积时或退火处理时的薄膜中颗粒的热力学和动力学的角度以及是否存在化学反应对半导体颗粒的形成机理做了进一步的探讨。 - In order to optimize parameters of sputter - depositeing used to manufacture silicon - based tm films in the next step , the dissertation analyses and explains the difference between the two surfaces of sputtered tini film from sputtering factors
为优化溅射工艺参数以用于后续的硅基tini薄膜制备，本文从工艺因素入手，对玻璃基溅射薄膜两个表面的质量差异进行了分析，并给出合理解释。 - The one deposited at 300 substrate temperature owns denser crystallites . during the annealing process , with the increasing of annealing temperature , the crystallites become bigger , and crystalline phase begins to transfer . when the annealing temperature gets to 800 , tio2 transfers to rutile structure completely
( 2 )常温下制备的tio _ 2薄膜是无定型的， 300溅射薄膜表面有致密的晶粒，热处理温度升高，晶粒变大，晶相开始转化， 800退火tio _ 2完全转化为金红石结构。