| 1. | The proximity effects of spin - splitting in superconducting junctions
超导结中自旋分裂的邻近效应 |
| 2. | The proximity effect of synmmetrical cable employing copper clad steel as conductor
采用铜包钢复合线的对称电缆邻近效应 |
| 3. | Optical proximity correction ( opc ) is emerging as an important tool in design and manufacturing of next generation integrated circuits
光学邻近效应校正( opc )是下一代集成电路设计和生产的重要工具。 |
| 4. | It may also be used to compensate for proximity effect or to reduce the low frequencies that can make an instrument sound dull or “ muddy
还可用它来补偿邻近效应，或降低可使乐器声音显得沈闷或“拖泥带水”的低频部分。 |
| 5. | Use this setting with vocals or instruments to compensate for proximity effect or to reduce the low frequencies that can make an instrument sound dull or muddy
可用它来补偿人声或乐器的邻近效应，或降低可使乐器声音显得沈闷或拖泥带水的低频部分。 |
| 6. | Piezoresistivity of ecac may involve proximity effect , microcrack and the staggered arrangements of conductive pass - ways due to shear strength of aggregates
压敏产生的原因是导电沥青混凝土试件的压缩邻近效应、微裂纹和石料间的剪切力使部分导电通路错位。 |
| 7. | As the ic manufacturing process develops from sub - micron to very deep submicron ( vdsm ) technologies , with current lithography tools ( 248nm and 193nm ) , foundries can not manufacture products that designs want because of so - called optical proximity effect ( ope )
当集成电路生产工艺发展到纳米级时，利用现有的曝光设备( 248nm和193nm ) ，由于所谓的光学邻近效应，集成电路制造厂商已经无法制造出满足电路功能要求的产品。 |
| 8. | Developing the lithography process models to properly characterize critical dimension ( cd ) variations caused by proximity effects and distortions introduced by patterning tool , reticule , resist exposure , development and etching , they are beneficial to develop a yield - driven layout design tool , the engineers could use it to automate the tasks of advanced mask design , verification and inspection in deep sub - micron semiconductor manufacturing
建立准确描述由于掩模制造工艺、光刻胶曝光、显影、蚀刻所引起的光学邻近效应和畸变所导致的关键尺寸变化的光刻工艺模型，有助于开发由成品率驱动的版图设计工具，自动地实现深亚微米下半导体制造中先进的掩模设计、验证和检查等任务。 |
| 9. | Based on the maxwell ' s equations , the one - dimensional foil conductor ' s current density distribution equals the sum of the independent skin effect and the proximity effect current density distributions , and the one - dimensional foil conductor ' s loss equals the sum of the independent skin effect and the proximity effect losses
本文从maxwell电磁场方程出发对一层薄铜箔的趋肤和邻近损耗进行了研究，得出铜箔的总损耗是趋肤和邻近效应单独起作用产生的损耗的和。 |
| 10. | For the coordination of the contradictory , the wavefront technique has been regarded as an effective method to improve the image quality in photolithography by optimizing the image of the mask . it includes : pupil filtering , phase shift mask , off - axis illumination , optical proximity correction , and so on
为了协调这种矛盾，利用波前工程来改善光刻图形的质量以提高光刻分辨率，已广泛地应用于光学光刻中，如：瞳孔滤波、相移掩模、离轴照明、光学邻近效应校正等。 |
