| 1. | Passive measurements of radon - part 1 : track etch method
氡的无源测量.第1部分:记录槽蚀刻法 |
| 2. | Various technical improvements have made it possible to push the limits of photolithography
各种技术若能改进，便可推进光蚀刻法的极限。 |
| 3. | Some of the techniques ( for example , advanced ultraviolet lithography for chip production ) will probably become commercial realities
某些技术，例如拿来生产晶片的高阶紫外光蚀刻法，很可能会受到业者广泛使用。 |
| 4. | Photolithography then reduces the size of the pattern in a process analogous to that used in a photographic darkroom [ see illustration on opposite page ]
接著，光蚀刻法用一种类似照相暗房中进行的过程（见右页图） ，把图案的尺寸缩小。 |
| 5. | The most prevalent procedure is to use photolithography or electron - beam lithography to produce a pattern in a layer of photoresist on the surface of a silicon wafer
最常用的步骤是用光蚀刻或电子束蚀刻法，在矽晶圆表面的光阻层上制作出图案。 |
| 6. | But because conventional photolithography becomes more difficult as the dimensions of the structures become smaller , manufacturers are exploring alternative technologies for making future nanochips
但由于结构变得更小后，传统的光蚀刻法变得更难做，因此业者正在找寻其他技术，以做出未来的奈米晶片。 |
| 7. | Small pieces were phacoed under pulse energy . results : ccc were primarily done successfully in 24 cases , then ccc done successfully after cortex were removed in 18 cases , ccc were finished after making a flap when radial tear occurred in 8 cases
方法:对成熟期白内障50眼作前囊连续环形撕囊，采用蚀刻法与劈核法相结合，核块以脉冲方式在囊袋内或囊膜上后房内乳化。 |
