English translation for "电子束光刻"
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- beamwriter lithography
electron beam lithography
Related Translations:
电子束形成: electron-beam formation 电子束密度: electron beam density 原始电子束: primary electron beam 电子束钻探: electrton-beam drilling 电子束振荡器: electron-beam generator 电子束沉积: electron beam deposition 电子束制作: electron beam fabrication
- Example Sentences:
| 1. | Electron-beam lithography with a novel multilevel resist structure defines the pattern .
采用新型的多层抗蚀剂结构的电子束光刻来形成图形。 | | 2. | Vector scan electron beam lithography
矢量扫描电子束光刻 | | 3. | By studying and using conventional 1c process in combination with electron beam lithography ( ebl ) , reactive ion etching ( rie ) and lift - off process , several efficient results are produced : semiconductor and metal nano - structures are fabricated ; the matching problem of photolithography and electron beam lithography is well solved ; the process efficiency is improved ; the process is offered for the controlled fabrication of nano - structures by repetitious process testing ; several nano - structures such as si quantum wires , si quantum dots , double quantum dot structures and tri - wire metal gate are firstly fabricated by using ebl and rie processes
研究利用常规的硅集成电路工艺技术结合电子束光刻，反应离子刻蚀和剥离等技术制备半导体和金属纳米结构，很好地解决了普通光刻与电子束光刻的匹配问题，提高了加工效率，经过多次的工艺实验，摸索出一套制备纳米结构的工艺方法，首次用电子束光刻，反应离子刻蚀和剥离等技术制备出了多种纳米结构(硅量子线、量子点，双量子点和三叉指状的金属栅结构) 。 | | 4. | Abstract : a new method for determining proximity parameters , , and in electron - beam lithography is introduced on the assumption that the point exposure spread function is composed of two gaussians . a single line is used as test pattern to determine proximity effect parameters and the normalization approach is adopted in experimental data transaction in order to eliminate the need of measuring exposure clearing dose of the resist . furthermore , the parameters acquired by this method are successfully used for proximity effect correction in electron - beam lithography on the same experimental conditions
文摘:在电子散射能量沉积为双高斯分布的前提下,提出了一种提取电子束光刻中电子散射参数,和的新方法.该方法使用单线条作为测试图形.为了避免测定光刻胶的显影阈值,在实验数据处理中使用归一化方法.此外,用此方法提取的电子散射参数被成功地用于相同实验条件下的电子束临近效应校正 | | 5. | In this thesis , mainly by fmr , combined with moke and magnetic measurement , systematical studies have been made on the magnetic properties , especially magnetic anisotropy in epitaxial single crystalline fe ultathin films on gaas and inas substrates in polycrystalline thin films and in polycrystalline nife and nifeco patterned films of micron and submicron rectangular elements arrays
本论文以铁磁共振为主要研究手段，辅助以磁性和磁光测量，对外延于gaas及inas上的不同厚度的单晶fe超薄膜、不同厚度的nife多晶薄膜和电子束光刻的多晶nife和nifeco单层利三明治结构的微米及亚微米矩形单元阵列图形薄膜的磁性，特别是磁各向异性进行了较为系统的研究。 |
- Similar Words：
- "电子束管内导电石墨乳" English translation, "电子束管水溶性外导电石墨乳" English translation, "电子束管油溶性外导电石墨乳" English translation, "电子束管支架" English translation, "电子束光点" English translation, "电子束光刻机" English translation, "电子束光刻用铬掩模" English translation, "电子束焊" English translation, "电子束焊机" English translation, "电子束焊接" English translation
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