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Home > chinese-english > "氧化铟锡" in English

English translation for "氧化铟锡"

ito indium tin oxide

Related Translations:
:  名词[化] (金属元素) indium (im)
氧化铟:  indium oxide
硝酸铟:  indium nitrate
放射性铟:  indium
铟泰:  indium
卤化铟:  indium halide
铟铜:  cuinse2
铟箔:  indium foil
胶体铟:  in colloid
铟石:  indite
Example Sentences:
1.The transparent conductive glass with indium - tin oxide films used in liquid crystal display
液晶显示器用氧化铟锡透明导电玻璃
2.Preparation of collagen indium and tin oxide composite coating with low infrared emissivity and study of the coating ' s properties
氧化铟锡复合红外低发射率涂料的制备及性能研究
3.J . r . stevens et al . , “ electrochromism of wo3 - based films in contact with a solid li - doped siloxane elastomer electrolyte , ” applied optics , 26 , pp . 3489 - 3490 , 1987
郑耀爵, “以离子束溅镀法制备氧化铟锡薄膜之光学、电学及可靠性质之研究, ”国立成功大学,硕士论文, 2003 。
4.The main transparent conductive oxide include indium tin oxide ( ito ) , al - doped zno ( azo ) , tin antimony oxide ( ato ) etc . ito is important material of making the transparent electrode
目前应用广泛的透明导电氧化物薄膜主要有氧化铟锡薄膜( ito ) 、氧化锌铝膜( azo ) 、掺锑氧化锡( ato )等。铟锡氧化物( ito )是制造透明电极的重要材料。
5.Deposition of additional thin layers of indium tin oxide and other compounds next to the electrodes altered the interaction of the thicker layers and also improved the efficiency of the injection of holes and electrons , thereby further upping the overall power efficiency of the fluorescent oled
将薄层氧化铟锡及其他化合物附置在电极旁,可以改变厚层间的交互作用,并改善电洞及电子的注入效率,因而可以进一步增加萤光oled的整体用电效率。
6.In those studying works , nano - composites of polymer were prepared for electromagnetic screening and transparent in military electronic units 、 apparatus 、 weapon equipments , electronic cabinets , to keep communications secrets for important offices 、 laboratory , designing technologic routes of inorganic nanoparticle / nano - composites of polymer , nano - stannum oxide , nano - indium stannum oxide were prepared
本课题的研究针对军用电子元器件、部件、武器装备、方舱、通信保密、重要办公室、实验室需要透明同时防电磁波泄露的需求,采取无机/高分子纳米复合技术路线,研制纳米氧化锡、氧化铟锡/丙烯酸酯类聚合物纳米复合材料。
7.Indium stannum oxide ( ito ) as semiconductor have caused a great deal of interest due to their prominent electro - optical behavior . ito has high prominent transmittance , high infrared reflectance , good electrical conductivity , ito applied as gas sensors , photovoltaic devices , heat reflecting mirrors , solar cells , flat panel displays , liquid crystal displays , electroluminescent , devices and organic light - emitting diodes ( oled ) etc . although preparations and applications of ito films have been studied deeply . nano - ito composites hardly studied
氧化铟锡( ito )是一种高简并的n型半导体,由于具有导电性,可见光高透过率,红外反射性,稳定的化学性,被广泛应用于热反射建筑玻璃、抗静电涂层,太阳能电池,热发射镜,平板显示器和液晶显示屏,传感器,有机光致二级管( oled )等方面,国内外对高质量的ito薄膜的制备和应用进行了深入的研究,但是很少有ito纳米粒子与高分子材料复合的报道。
8.Liquid crystal display ( lcd ) production is high - tech industry , its manufacturing technology concerns many subjects , such as chemistry , physics , optics , electronics and mechanics etc . the manufacturing processes of lcd are very strict with the processes control , equipment , materials and environment etc . in order to solve the difficult problem of lcd manufacturing technology , to promote manufacturing capacity , and to increase the current state of the art and additional production value of lcd , the paper emphasizes on the research of the key manufacturing technology , which are the optical and electrical properties of the ito ( in2o3 : sn ) films , the automatic alignment and assembly system of lcd substrate , and the optimized design of lcd parameters
液晶显示器( lcd )的生产属于高新技术产业,其制造技术涉及化学、物理、光学、电子和机械等多学科领域。其生产过程对工艺、设备、材料、环境等诸因素均有十分严格的要求。为解决液晶显示器制造过程中的技术难题,提升制造能力,提高产品技术档次及其附加值,本文着重研究了ito (氧化铟锡)导电膜的光电特性、 lcd基板自动对位贴合系统、液晶盒的参数优化设计等液晶显示器制造过程中若干关键制造技术。
9.Among these methods , magnetron sputtering is the most widely used technique for preparing thin films , owing to its high deposition rate and good uniformity etc . ito films were prepared by rf and dc magnetron sputtering in pure argon gas atmosphere , using in2o3 and in target mixed with sno2 ( 10wt % ) and sn ( 7wt % ) respectively
其中磁控溅射工艺具有沉积速率高均匀性好等优点而成为一种广泛应用的成膜方法。本研究课题分别以氧化铟锡靶和铟锡合金靶为靶材,采用射频磁控溅射和直流反应磁控溅射工艺在氩气气氛中沉积ito薄膜。靶材中sno _ 2和sn的掺杂重量比例分别为10和7 。
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