| 1. | Newer materials, such as syton, are chemo-mechanical and are beginning to be used .
较新的材料，如Syton这种化学机械抛光剂正开始使用。 |
| 2. | Analysis on pad effects in chemical mechanical polishing
化学机械抛光中抛光垫作用分析 |
| 3. | Chemical mechanical polishing for mutilevel interconnect in ulsi
多层互连中的化学机械抛光工艺 |
| 4. | Chemical mechanical polishing planarization , cmp
化学机械抛光 |
| 5. | Corrosion and passivation of copper in the cmp slurry of ch3nh2 - k3 fe
铁氰化钾化学机械抛光液中的腐蚀与钝化 |
| 6. | Chemmically - mechanically polish
化学机械抛光 |
| 7. | Newer materials , such as syton , are chemo - mechanical and are beginning to be used
较新的材料，如syton这种化学?机械抛光剂正开始使用。 |
| 8. | Newer materials , such as syton , are chemo - mechanical and are beginning to be used
较新的材料，如syton这种化学机械抛光剂正开始使用。 |
| 9. | Modeling of chemical mechanical polishing material removal based on molecular - scale mechanism
基于单分子层去除机理的芯片化学机械抛光材料去除模型 |
| 10. | Specification : metal ingot , mechanically polished , the detailed specification can be customized in size according to your request
形状：金属锭，机械抛光，每块大小可按您的要求。 |
