English translation for "射频溅射"

radio frequency sputtering
radio-frequency sputtering
rf sputtering

Related Translations:

和溅射效果:  spatter

高能射频:  herf

射频电容器:  radio frequency capacitorradio-frequency capacitor

射频表:  rfc radio frequency chart

脉冲射频:  pulse radiation frequency

射频鉴别:  radio frequency identification

射频电路:  radio circuitradio frequency circuitradio-frequency circuit

射频谐波:  radio-frequency harmonic

射频损失:  radio-frequency loss

射频频谱:  radio frequency spectrumradio spectrumradio-spectrumradiofrequency spectrum

Example Sentences:

	1.	Target material was hexagonal boron nitride ( hbn ) and working gas was pure argon 用射频溅射法在si衬底上制备立方氮化硼，靶材为hbn ， 。工作气体为氩气。
	2.	Cdte films deposited by close space sublimation have better appearance and larger grain than the films deposited by rf - sputtering and vacuum thermal evaporation 近距离升华法制备的cdte薄膜与射频溅射和真空蒸发相比，具有其独有的特性。
	3.	Boron nitride ( bn ) thin films were deposited on si substrates using the conventional radio - frequency ( rf ) sputtering system , with hexagonal boron nitride ( hbn ) target and working gas of argon ( or mixture of nitrogen and argon ) 使用射频溅射( rf )系统,靶材为烧结的六角氮化硼( hbn ) ,工作气体为氩气(或氩气和氮气的混合气) ,在硅衬底上沉积氮化硼薄膜。
	4.	The realization of the algorithm drives the research of micro - electron structure . 2 . the la2o3 thin film is prepared by rf technology , the film is analyzed by arxps , the thickness is calculated by quantitative analysis software , the thickness of sio2 thin film between la2o3 and si is 0 . 6nm 利用射频溅射镀膜技术在si片上制备了la _ 2o _ 3膜，通过变角xps分析和多层结构的定量计算，测得la _ 2o _ 3与si衬底之间的sio _ 2层厚度为0 . 6nm 。
	5.	In the paper , the two - step approach , in which the deposition procedure was divided into two sections by decrease the substrate temperature or the bias voltage , was used in order to synthesize c - bn film by the conventional js - 450a rf system . the influence of process parameters for nucleation and growth of depositing c - bn was studied separately 本论文使用传统的js - 450a射频溅射系统利用两步法（降温降偏压法）沉积立方氮化硼薄膜，分别研究了各工艺参数对立方氮化硼成核和生长的影响。
	6.	It is concluded that for cvd method the cubic phase content and adhesion are highly effected by the crystal lattice mismatch between c - bn and substrate materials , however , for sputter method the crystal lattice mismatch between c - bn and substrate materials affects the quality of c - bn thin films very little . 5 n - type doping of bn thin films and preparing of bn ( n - type ) / si ( p - type ) heterojunctions adding s into the mixture of argon and nitrogen used as working gas , we sputtered 1ibn target to deposit bn thin films so as to study the n - type doping of bn thin films , and bn ( n - type ) / si ( p - type ) heterojunctions were prepared 5实现了氮化硼薄膜的n型掺杂，成功制备出bn型）乃…型）异质结并且首次系统研究了其卜v和cv特性我们用射频溅射法溅射六角氨化硼靶，在工作气体氮和氮中混入s ，沉积氮化硼薄膜，以研究氮化硼薄膜的n型掺杂，并得到bnh型）侣i …型）异质结。
	7.	The c - bn thin films were deposited on si substrates using the conventional radio - frequency ( rf ) sputtering system . the c - bn / si thin film heterojunctions have been fabricated with doping into n - type ( p - type ) semiconductor by implanting s ( be ) ions into them . i - v curves of bn / si heterojunctions were obtained by the high resistance meter , c - v curves of bn / si heterojunctions were obtained by the c - v meter 使用rf射频溅射系统,在si衬底上沉积氮化硼薄膜,用离子注入的方法在制备好的bn薄膜中分别注入s和be ,成功的制备了bn / sin - p和bn / sip - p薄膜异质结,用高阻仪测得bn薄膜表面电阻率和bn / si薄膜异质结的i - v曲线,用c - v仪测得bn / si薄膜异质结的c - v曲线。

Similar Words：

"射频加速结构" English translation, "射频加速器" English translation, "射频监测接收机" English translation, "射频监控器" English translation, "射频鉴别" English translation, "射频交流发电机" English translation, "射频接口" English translation, "射频接收管" English translation, "射频接收机" English translation, "射频接收装置" English translation