| 1. | Photolithographic diffusion windows
光石版印刷扩散窗 |
| 2. | An experimental double - beam and double - exposure interference photolithographic system has been established
建立了双光束双曝光干涉光刻实验系统。 |
| 3. | I understand the circuits are etched into the wafer by repeating the photolithographic process of light exposure and chemical treatment
我知道这些电路是通过照相平板印刷法的曝光和化学处理蚀刻到晶元上的。 |
| 4. | As shopping - mall - style chips continue to sprawl outward , for example , it becomes increasingly hard to keep the photolithographic image in focus at the edges
而且连接到远处的导线太长，会导致讯号延迟，因而减低了晶片的效能及复杂的功能。 |
| 5. | The photolithographic tools that will be used to make chips with features well below 100 nanometers will each cost tens to hundreds of millions of dollars
要在晶片上做出小于100奈米的图案细节，所需的光蚀刻工具每件要花上几千万到几亿美元。 |
| 6. | The structure and basic theory of the electrical control system of the precision workbench . it is applied in quasi - molecular laser photolithographic technology
本文论述了精密工作台电控系统的结构及工作原理，它主要应用于准分子激光光刻技术中。 |
| 7. | Back then , chip designers considered it risky to add two or three layers of metal on top of the silicon wafer because each new layer added hills and valleys that made it difficult to keep photolithographic patterns in focus
当时的晶片设计者认为在矽晶圆上加上两三层金属有点冒险，会使晶圆表面凹凸不平，增加光刻过程中聚焦的困难。 |
| 8. | The methods and systems ( including amplitude division double - beam interference system , three - beam interference system , liquid immersion type deep uv interference system and full automatic interference photolithographic system ) for amplitude division maskless laser interference photolithography are studied and compared
研究和比较了振幅分割无掩模激光干涉光刻方法和系统，包括振幅分割双光束干涉系统、三光束干涉系统、液浸式深紫外干涉系统及全自动干涉光刻系统。 |
