The exposal source of liga technology is expensive synchrotron radiation x - ray , so that constrains it ’ s wide application Liga技术需要昂贵的同步辐射x射线源,因此,限制了其广泛的应用。
2.
And the dependences of the depth of exposal on exposal time as well as on laser power are studied 然后在实验上研究并分析了曝光深度随曝光时间的变化规律和曝光深度随曝光功率的变化规律。
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With the third harmonic 355nm nd : yag laser as the exposal source , the lithography of su - 8 photoresist is studied 本文采用波长为355nm的三倍频nd : yag激光作为曝光光源,对su - 8光刻胶进行光刻研究。
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The laser - liga technology provided by this research is the first technology to use ultraviolet laser as the exposal source for su - 8 photoresist lithography . it is a technology with lower cost and big potential to increase the aspect ratio as well as wider application 本文首次提出采用紫外激光作为曝光光源的laser - liga技术,对su - 8胶进行曝光光刻不仅成本低、易推广,而且具有大幅度提高光刻深宽比的潜力。
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After review of the captioned aspects , we may find that we have to solve several problems of different levels like : to make the owner of state - owned assets and their agents to act as real owner and agent not government officer , to make the information exposal mechanism more effective and to make the behavior of supervising bureau more effective 而且我们比较的终极目的是要寻找那些对于我们国家的治理问题有一定借鉴意义的思路，而不是全盘照搬。我们认为，要改变目前这种现状，需要做许许多多的工作，包括：政府以适当方式行使自己作为国有股股东的权利并履行义务；加强外部的监督机制和惩罚机制，建立公众的上市公司和政府的信心等。
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It is found that with fixed laser power and increasing exposal time , the increasing of the depth of exposal grows slower , the exponential increasement can be express by the equation : , the depth of exposal becomes satured with increasing exposal time ; with fixed exposal time and increasing laser power , the depth of exposal increases linearly and can be express by the equation : y = 40 结果表明,当固定曝光功率,不断增加曝光时间时,曝光深度的增加趋于缓慢,程指数曲线形式变化,可表示为,当曝光时间不断增加时,曝光深度的增加趋近于饱和;当固定曝光时间,不断增加曝光功率时,曝光深度程线性趋势增加,可表示为y = 40 . 5x0 . 151y = 0
