| 1. | Study on heterodyne transmission ellipsometry and nonlinearity error 透射式外差椭偏测量及非线性误差分析 |
| 2. | Measurement of the electric - optic index of thin films by using modulated ellipsometry 利用调制式椭偏仪测量薄膜电光系数 |
| 3. | Spectroscopic ellipsometry of sic si heterostructures formed by c implantation into crystalline silicon 异质结构的椭偏光谱 |
| 4. | Ellipsometry that is applied to lots of fields such as physics . chemistry . hylology 鉴于当前对该课题研究的不足,本论文对该课题进行了研究。 |
| 5. | Vfsa application in ellipsometry data computing and the improvement tactics of the algorithm 非常快速模拟退火算法在椭偏数据处理中的应用及其改进策略研究 |
| 6. | Azimuth , in ellipsometry - the angle measured between the plane of incidence and the major axis of the ellipse 椭圆方位角-测量入射面和主晶轴之间的角度。 |
| 7. | Azimuth , in ellipsometry - the angle measured between the plane of incidence and the major axis of the ellipse 椭圆方位角-测主和面射入量晶轴之间的角度。 |
| 8. | The deposited cu - mgf2 cermet films were analyzed by xrd , ed , tem , ir , uv , ellipsometry and temperature - varied four - wire technique 用ir 、 uv及椭圆偏振光谱技术测量分析样品从红外-近紫外波段的透射、吸收及反射光谱特性。 |
| 9. | To this end , we have performed in situ ellipsometry measurements while etching through homogeneous , comparatively thick sige films of a known ge content 为此,我们实施了对于刻蚀均匀的比较厚的已知锗浓度的锗硅薄膜的同步椭偏测量。 |
| 10. | Since ellipsometry is not sensitive to emission or absorption of light by the plasma , it is one of the few surface techniques that is compatible with a plasma environment 因为椭偏仪对等离子的光的发射和吸收不敏感,它是少数几种与等离子环境相兼容的表面技术之一。 |