| 1. | The higher value is comparable to those obtained in cvd epitaxy .
这个高的数值可以和从化学气相淀积外延得到的数值相比拟。 |
| 2. | Particulates can emanate from process equipment (e.g., in cvd and etch reactors)as well as from humans (from street clothes, skin flakes, etc. )
尘粒也能由工艺设备（如化学气相淀积和刻蚀反应器）以及工作人员（身穿的外套，体表的皮屑等）而产生。 |
| 3. | In contrast to the cvd process, mbe does not require the extensive safety precautions, although solid arsenic dopant must be handled carefully .
和化学气相淀积工艺相反，虽然在操作中对于固体砷还是必须非常小心掌握，但是，分子束外延不需要庞大的安定保险装置。 |
| 4. | General situation of cvd diamond film coating tools
金刚石薄膜涂层工具的研究概况 |
| 5. | Study of adhesion of cvd diamond film coated tool
金刚石涂层刀具切削性能的试验研究 |
| 6. | Cutting performances of cvd film coated tools
金刚石薄膜涂层刀具切削性能研究 |
| 7. | Progress and prospect of cvd continuous sic fibers
纤维的研究现状和发展趋势 |
| 8. | Characterization of zn 2 183 ; h2o synthesized by cvd
化学气相沉积产物的表征 |
| 9. | The research on laser cutting technology of cvd diamond film
金刚石膜激光铲平切割工艺研究 |
| 10. | Inductive coupled plasma enhanced cvd system
电感性耦合等离子体增强型 |
