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electron diffraction meaning in English

电子衍射,电子绕射

Examples

  1. The ultra - thin er layers with the thicanesses in the range of 0 . 5 ~ 3 monolayer ( ml ) are formed by electron beam evaporation on si ( 00l ) substrate at room temperature in an ultra - high vacuum system . after annealing at lower temperatures , ordered simcfores form on the surface . the trallsition of the surface reconsmiction pattem from ( 2 x l ) to ( 4 x 2 ) with the increase of er coverage up to l ml is observed by the reflective high energy electron diffraction ( rheed ) and low energy electron diffraction ( leed )
    本文是关于硅( 001 )衬底与电子束淀积的铒、铪原子反应形成的超薄膜的界面与表面性质的研究,以及在该衬底上出现的共振光电子发射现象,包括了以下四个方面的工作: 1铒导致的硅( 001 )衬底上的( 4 2 )再构研究利用反射高能电子衍射和低能电子衍射,在室温淀积了0
  2. Besides , the growth of gasb expitaxy film was monitored by reflection high energy electron diffraction ( rheed ) . the rheed images and intesity oscillation are collected by computer system . it showed that the gasb film prepared in 400 was amorphous and it became monocrystalline when the temperature rose to 500 . atomic force microscope ( afm ) was applied to analyse the surface morphology of the films which were grown in diffrent growth rates or substrate temperature . the analysis were compared to simulation results . the experiment results indicated it was easy to form clusters when the rate of growth is high or
    此外,本文通过反射式高能电子衍射( rheed )监测了gasb外延薄膜的生长,利用rheed强度振荡的计算机采集系统实现了rheed图像和rheed强度振荡的实时监测。实验发现在400生长的gasb薄膜为非晶态,温度升高到500薄膜转变为单晶。利用原子力显微镜对不同生长速率和衬底温度生长的gasb薄膜的表面形貌进行观察分析,并与模拟结果进行比较。
  3. The explosive welding specimen were also annealed in vacuum at various elevated temperature from 1000 to 1300 . optic microscope , sem , tem and eds ( electron diffraction scattering ) techniques are applied to observe the microstructure and the element profiles of the welding interface and the interdiffused layer , reveal the interdiffused performance of alloy elements at elevated temperature , and analyze the structure and composition of the precipitated phases . moreover , the tensile strength of welding line with the two different techniques and various welding parameters were carried out
    采用金相、扫描电镜、透射电镜、能谱等多种实验手段对焊接结合层的微观组织结构、高温下nb - 1zr与不锈钢合金元素的互扩散行为,形成的互扩散层的成分、金相组织和扩散层中的析出相的相组成和相结构等,都进行了较为详细的分析,并且对在不同工艺、不同焊接参数下焊接的nb - 1zr合金和不锈钢的焊缝做了强度实验研究。
  4. For xrd , ellipsometry examinations , single - side - polished si ( lll ) wafers were used as substrates and for resistance measurement , glass was used and for infrared examination , double - side - polished si ( lll ) wafers were used and for ultraviolet - visible spectrophotometry , double - side - polished quartz wafers were used and for tem micrograph and electron diffraction pattern observation , cu nets deposited by formvar film were used . the cu - mgf2 cermet films were from 50 to 600nm thick
    用于xrd分析、椭偏测量的单抛si ( 111 )晶片和电阻测试的载玻片上淀积膜厚约为600nm ;用于ir测试的双抛si ( 111 )晶片和uv测试的石英玻璃片上淀积膜厚约为250nm ;用于透射电镜分析的样品则淀积在400目铜网上的支撑formvar膜上,膜厚约为50 100nm 。
  5. The synthesis process of single - wall carbon nanotubes ( swnts ) by catalytically chemical vapor deposition ( ccvd ) was investigated and the product was characterized with transmission electron microscopy ( tem ) , electron diffraction ( ed ) , electron dispersive spectra ( eds ) and raman scattering spectra etc . pyrolysis of methane over solid catalysts prepared with impregnation , ion - adsorption precipitation , and sol - gel technique can all lead to the growth of swnts
    本文研究了单壁纳米碳管的化学气相沉积法( cvd )制备工艺,并运用透射电子显微镜( tem ) 、 x - ray能谱( eds )与喇曼( raman )光谱等分析手段,对产物及催化剂进行了表征。采用浸渍法、吸附沉淀法与溶胶凝胶法等制备了催化剂,并合成了单壁纳米碳管。
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Related Words

  1. fresnel region of diffraction
  2. active electron
  3. electron optic
  4. electron traps
  5. electron p
  6. electron crystallography
  7. sigma electron
  8. electron impact
  9. electron defectoscope
  10. electron path
  11. electron device
  12. electron device testing
  13. electron diffraction analysis
  14. electron diffraction apparatus
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