| 1. | Influence of energy flow density of ion current on growth of diamond - like carbon thin films
离子能流密度对类金刚石薄膜成膜的影响 |
| 2. | Measurements of the electrical properties of transmitting tubes - measuring methods of anode ion current
发射管电性能测试方法阳极离子流的测试方法 |
| 3. | Under a certain magnetic field , the density and stability of anode plasma determines the ion current density and its fluctuation
在确定磁场强度下，阳极等离子体密度和稳定性决定了引出离子束流密度的大小及其波动幅度。 |
| 4. | Plasma immersion ion implantation ( phi ) seems to be an alternative approach to reduce the manufacture cost of soi wafers due to its large ion current and independence of implantation time to the wafer size
等离子体离子注入( p )技术由于其强束流和大面积注入方式而有希望在soi材料制备方面获得突破。 |
| 5. | In this paper , it was introduced of the system designing , debugging and optimizing . the substrate saturation ion current and film deposition rate were measured and ion efficiency was obtained
介绍了脉冲磁过滤阴极弧的系统组成、设计和调试，并详细介绍了调试中碰到的各种具体问题及其分析解决过程及方法。 |
| 6. | It is found that the ablated surface morphologies for both the ti samples of different roughness have a similar change trend from roughening to smoothing with increasing the shot number , where the surface roughening is relatively weaker at lower ion current density
通过辐照不同原始粗糙度的纯金属ti发现，随着辐照次数的增加，烧蚀表面形貌均发生表面粗糙化向光滑化的转变。离子束流密度较低时，辐照表面的粗糙化程度较弱。 |
| 7. | ( 3 ) chapter v . plasma characteristics of rf ion source is investigated . a zero - dimensional numerical dynamic colisional radiative atomic and molecular ( cram ) model is suggested to simulate the microphysical process . all species " population number densities in plasma are calculated in non - thermodynamics equilibrium condition , and proton content in extracted ion current are measured with 60 ? magnetic analyzer
( 3 )提出了高频离子源等离子体的零维cram模型( collisionalradiativeatomicandmolecularmodel ) ，计算了非平衡态( nte )下等离子体中分子、电子、离子、基态原子、激发态原子等粒子浓度，并在zf - 200kev中子发生器上，用60磁分析器实验测定了引出束流的质子比。 |
| 8. | In the hipib strengthening experiments , samples of high - speed steel ( w6mo5cr4v2 ) were irradiated by abstract hipib ( cn + = 30 % , h + = 70 % , ion energy 250 kev , ion current density 60 - 180a / cm2 , pulse duration 80 - 100 ns ) . microstructure investigation and properties characterization of the treated hss samples were carried out to investigate the effect of current density and pulse number of incident hipib on the surface modification treatment . the physical mechanism of the hipib - solid interaction was established based on the experiments
在hipib轰击材料表面方面，本文选择成分由c ~ ( n + ) ( 30 )和h ~ + ( 70 )组成、加速电压为250kv 、脉冲宽度为80 100ns的hipib对高速钢( w6mo5cr4v2 )进行表面辐照处理，研究离子束流密度和脉冲次数对高速钢微观结构和宏观性能的影响，探讨了hipib与材料表面相互作用的物理机制。 |
| 9. | The maximum output of ion beam current is obtained at a charging voltage of 8 kv for the magnetic field power system , which is in accordance with the theory of magnetic insulation . the ion beam parameters are an accelerating voltage of 300 kv , an ion current density of 300 a / cm2 with beam pu lse width of 80 ns and with composition of 70 % proton and 30 % carbon ions
在磁场电源电压为8kv ，获得了与磁绝缘理论相符的最大离子束流密度输出，离子束参数为：加速电压300kv ，离子束流密度300a cm ~ 2 ，离子束脉冲宽度80ns ，成分约为70 h离子和30 c离子。 |
| 10. | At the delay time when the area on the anode surface bombarded by electrons expands to a maximum field , the upper limit of ion beam current output is reached . the ion beam parameters are an accelerating voltage of 220 kv , an ion current density of 350 a / cm2 with beam pulse width of 70 ns and with composition of 30 % proton and 70 % carbon ions
在电子流对阳极轰击面积达到最大所对应的延迟时间，获得了最大离子束流密度输出，离子束参数为： 220kv ， 350a cm ~ 2 ， 70ns ，成分约为30 h离子和70 c离子，离子束流密度的波动同样可控制在20 。 |
