靶电压 meaning in Chinese

target voltage

In the work , mid - frequency pulse magnetron sputtering is used to prepare znoral thin films used as the back reflector of the thin silicon films solar cells . the best techological condition was obtained by optimizing the preparing conditions , ( var is decided by the deposition rate , target voltage : 265v , gas pressure : 0 . 6pa , the high base vacuum is expected
本文采用中频脉冲磁控溅射法，通过优化zno ： al薄膜的制备工艺，如靶电压、本底真空度、工作气压、衬底温度、 o _ 2 ar ，得到可用于硅薄膜太阳能电池背电极的zno ： al薄膜。
Many measures were adopted to decrease bombard in order to improve the solar cells propertivity , such as decreasing target voltage , increasing target distance , accelerating the movement of the substrate . by optimizing the experimental conditions , short - circuit current was increased by 3 . 7ma / cm2 , the conversion efficiency was increased by 2 % , the stability was improved
在硅薄膜电池的zno ： al al背反射电极应用方面，通过减小靶电压、适当增加靶距和基片的运行速度来减小对电池的轰击，改善电池性能，通过优化实验条件，使电池的短路电流提升了3 . 7ma cm ~ 2 ，效率增加了2 ，稳定性得到改善。