腐蚀溶液 meaning in Chinese

etchant solution

Process parameters related to the film quality are discussed ; relations are found between the etching rate and different process parameters when sio2 and cr thin films are etched in an inductively coupled plaslma ( icp ) etching equipment ; the tmah eroding solution ’ s ph value under different temperatures and concentrations are studied , since the etching process can be controlled by the ph value
3 .初步研究了利用pecvd淀积si3n4薄膜的工艺,讨论了影响薄膜质量的相关工艺参数;初步研究了用icp刻蚀sio2和cr的相关工艺;通过分析不同浓度tmah腐蚀液在不同温度下其ph值的变化,研究了以溶液ph值作为腐蚀溶液的控制参数。