等离子体源 meaning in Chinese
plasma source
Examples
- The thickness of film is frequent non - uniform , and factors are a good many . in practice , the production of uniform - thickness coatings from geometric position in the vacuum chamber
研究表明，使用等离子体源辅助沉积的光学薄膜折射率明显提高，更加接近于块状材料，膜层结构比传统沉积手段更加致密，附着力也很高。 - This paper mainly discusses the performance specification of plasma source ( gis ) , technology and quality of tio2 and sio2 coatings and the technology for large antireflection coatings deposited with plasma - iad . the research shows that the index of optical coating increases remarkably by using plasma ion assisted deposition and approach to the massive material further , the coating structure is more compacted than the one obtained through conventional deposition method and the adhesive power is high as well
研究了用于辅助镀膜的等离子体源( gis )的结构原理及性能指标，并从光学特性、显微特性和机械特性三方面着手，研究了使用等离子体源所做的单层tio _ 2膜和单层sio _ 2膜的成膜工艺与质量。 - ( ii ) charging effects on temporal and spatial evolution of dusty plasma sheath in plasma source ion implantation . the temporal and spatial evolution of a dusty plasma sheath in plasma source ion implantation has been investigated with a fluid theory and a self - consistent dust - charging model . a negative potential pulse is introduced to form the plasma sheath
( )尘埃粒子的充电效应对等离子体源离子注入( ps )鞘层时空演化的影响采用流体模型及自洽的尘埃粒子充电模型，我们研究了等离子体源离子注入时的尘埃等离子体鞘层的时空演化。