移相掩模 meaning in Chinese
phase-shift masks
Examples
- A phase - compatibility rule checker for standard cell layout designed with alternating psm
一种用于标准单元版图交替移相掩模相位兼容性规则检查的工具 - The paper is for verification and design of manufacturability of opc and psm as these two ways have become the most important correction ways
由于光学邻近校正和交替移相掩模已经成为最主要的掩模校正方法，因此本文主要针对这两种方法进行可制造性的验证和设计。 - A soft - ware implementing this method is presented as well , which has the capabilities of verifying standard cell layout , locating features with phase conflicts and giving out suggestions for modification
基于此方法的软件工具能够检查标准单元版图，找出不符合交替移相掩模设计要求的图形，并给出相关的修改建议。 - Before more advanced lithography tool is produced , in order to use current tools to manufacture vdsm ic , reticle correction methods such as perturbing the shape ( via optical proximity correction ( opc ) ) or the phase ( via phase - shifting masks ( psm ) ) of transmitting aperture in the reticle are proposed by the industry
在波长更小的光刻系统出现前，为了能利用现有设备解决集成电路的可制造性问题，工业界提出了对掩模作预失真(光学邻近校正)和在掩模上加相位转移模(移相掩模)等的掩模校正方法。 - The second is about verification of alternating psm manufacturability and this part introduces a new method based on standard cells to resolve the phase conflicts , including for dark field and for clear field . the method has the capabilities of verifying standard cell layout , locating features with phase conflicts and giving out suggestion for modification
第二部分针对由传统方法设计出的版图不能满足交替移相掩模要求的问题，介绍了一种基于标准单元的交替移相掩模可制造性验证与设计的算法，包括针对暗场和亮场两种不同环境版图的算法。