离子束溅射 meaning in Chinese
ion beam sputtering
ion-beam sputtering
Examples
- Property comparison of optical thin films prepared by e - beam , ion assisted deposition and ion beam sputtering
离子辅助和离子束溅射三种工艺对光学薄膜性能的影响 - A control system for the thickness of ion beam sputter ( ibs ) coating is introduced in this paper . the basic principle of ibs coating machine is discussed . this paper also gives the scheme of hardware and sofeware
本文介绍了离子束溅射镀膜机膜厚控制的一种实用的系统，文中论述了离子束溅射镀膜机的工作原理及镀膜厚度控制系统的硬、软件的实现方案。 - Abstract : based on the splashing mechanics microeffect ， this paper introduced the principle of ion beam removal machining it analysed the influenced factors of production efficiency ， studied the structure and working principle of the device of ion beam removal machining
文摘:从离子束溅射的微观力效应出发，介绍了离子束去除加工的原理，分析了影响加工效率的因素，并对加工装置的结构及工作原理进行了探讨。 - We prepare the si - sio2 and ge - sio2 thin film by using the dual ion beam co - sputtering method and the rf co - sputtering technique respectively , adjusting the substrate temperature ( ts ) and the annealing temperature ( ta ) . then we analysis the structure of the thin film by using the xrd and tem
论文采用双离子束溅射和射频磁控溅射沉积技术，通过改变薄膜沉积过程中基片温度( t _ s )以及薄膜制备完成后退火温度( t _ a )分别制备了si - sio _ 2和ge - sio _ 2薄膜。 - The influence of depositing condition on the depositing rate and the structure of the films were studied by the aid of tem and xrd . when the temperature ( ts < 450 , ta < 800 ) is low , the structure of the samples is still amorphous . the majority content of the sample is sio 90 by the aid of xps
利用双离子束溅射沉积技术，通过共溅射方法制备了si - sio _ 2薄膜，研究了沉积时间、工作气压p _ ( ar ) 、基片温度等对沉积速率的影响，用tem和xrd分析了样品的结构。