电子束刻蚀 meaning in Chinese

electron-beam lithography

At present , feas have potential for use as an electron source in a wide variety of applications , including microwave power amplifiers ( such as twts , klystron ) , flat panel displays , electron microscopy , and electron beam lithography
目前,场致发射阵列阴极的应用领域十分广泛,主要包括微波器件(应用于twts , klystron等) 、平板显示器( feds ) 、电子显微镜及电子束刻蚀系统等。其中,应用研究的焦点主要集中在平板显示器和射频功率放大器。