物理溅射 meaning in Chinese

physical sputtering

The theory of ion - beam etching and ion sources are reviewed . the classification of ion - beam etching are introduced . according to the mechanism that ion sputtering leads to faceting , trenching , reflection and redeposition , some relative solutions are put forward
综合叙述了离子束刻蚀技术和离子源的工作原理,简单介绍了离子束刻蚀的分类,阐述了离子束刻蚀的物理溅射效应导致的刻面,开槽,再沉积等现象的产生机理及解决办法,分析了kaufman离子源进行ribe的可行性及出现的问题。