溅射淀积 meaning in Chinese
sputter deposition
Examples
- For vlsi, a plane surface may be approximated by depositing the interlevel dielectric by bias-sputter deposition (see section 9. 2. 4) or by using planarization .
对于超大规模集成电路的平面状表面，可以用偏置溅射淀积法的层间介质淀积（见924节）或用平面化工艺来近似获得。 - For vlsi , a plane surface may be approximated by depositing the interlevel dielectric by bias - sputter deposition ( see section 9 . 2 . 4 ) or by using planarization
对于超大规模集成电路的平面状表面，可以用偏置溅射淀积法的层间介质淀积（见9 2 4节）或用平面化工艺来近似获得。