氧化气氛 meaning in Chinese
oxidative atmosphere
oxidized condition/atmo here
oxidized condition/atmosphere
oxidizing atmosphere
Examples
- Note : the above heat treatment conditions are all in an oxidation atmosphere
注:以上热处理条件均是在氧化气氛中 - The ultraviolet absorption edge becomes steep and moves to longer wavelength , and the optical band gap decreases . the optimal quality and ultra - violet absorption property of the zno thin film annealed at 450 are obtained
中性气氛中退火薄膜的电阻率基本不变,在真空和还原气氛中薄膜的导电能力增强,而在氧化气氛中薄膜的电阻显著增加了七个数量级,成为绝缘薄膜。 - Abstract : by means of mineralogical study of earlier slag samples of the flash furnaceanalyze the mineralogical composition and its variation , so that expose oxidation atmosphere in furnace and required controlled parts in the later smelting
文摘:本文通过对闪速炉前期炉渣的矿物学研究，分析矿物的组成及变化情况，以揭示炉内氧化气氛的强度及在后期冶炼中需注意控制的部分。 - Water steam was used as oxidant , and the optimum water steam partial pressure is between 1 10 - 4 and 5 . 5 10 - 4 pa . under the optimum growth parameters , a ceo _ 2 seed layer with highly textured degree was successfully prepared . beside the one step process was experimented in this dissertation , the two step process was proposed and studied to further improve the quality of ceo _ 2 seed layer . in the two step process , about 15 nm thick of ce metal layer was deposited on metallic substrate at the first step , then water steam was introduced in the chamber , and the ceo _ 2 thin films were subsequently deposited with reactive sputtering in the
总结出沉积ceo _ 2薄膜的优化工艺条件,当沉积温度为720 - 850 、水蒸汽分压介于1 10 - 4 - 5 . 5 10 - 4pa之间、退火时间40min时,获得了织构程度良好的ceo _ 2种子层薄膜; 3 .由于一步法制备ceo _ 2种子层中水分压范围狭窄,工艺条件难以控制,并且退火延长了薄膜的制备时间,因此,本论文又采用了两步生长法沉积ceo _ 2种子层,即:先在ni - w基带上沉积一层约15nm的金属ce薄膜,再通入氧化气氛(水蒸汽) ,继续进行薄膜沉积。