显影参数 meaning in Chinese

photographic parameter

Based on the analysis , we find refractive index of resists changes during bleaching process , and the exposure parameters vary with resist thickness , so as the development parameters . therefore , the dill exposure model and mack development model are improved , so that they are suitable for the simulation of thick resist lithography . in addition , the calculation errors from refractive index changes are discussed
针对厚层抗蚀剂在曝光过程中折射率发生了变化以及曝光参数随抗蚀剂厚度变化的特点，改进了原有的曝光模型；针对厚层抗蚀剂显影参数随抗蚀剂厚度变化的特点以及在显影过程中出现的表面抑制效应现象，改进了原有的显影模型。