无掩模 meaning in Chinese
maskless
Examples
- The prospect for the maskless lithography technology
无掩模光刻技术的前景 - The beam division method in maskless laser interference photolithography can be divided into wave - front division and amplitude division
摘要无掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。 - Simulation and experiments show that for point array or hole array patterns with the same sizes maskless interference photolithography is much simple than the traditional photolithography
模拟和实验结果表明，对点阵或孔阵图形，在同样的图形尺度下，无掩模干涉光刻比传统光刻简单得多。 - Based on light interference , diffraction and optical holography theory , the paper comprehensively describes the basic principle , main types , development trend as well as the objective and significance for carrying out the research of laser maskless interferometric lithography and holographic lithography
本论文基于光的干涉和衍射及光学全息照相理论，综合评述了光学光刻的基本原理、主要类型、发展趋势及开展激光无掩模干涉光刻和全息光刻研究的目的和意义。 - The theoretical research , computer simulation and experimental results analysis show that maskless laser interferometric lithography and holographic lithography have the characteristics of large field of view , high resolution , distortionless , relatively simple system structure , low costs and convenient realization way . they have a broad application prospect
激光干涉光刻技术研究四川大学博士学位论文理论研究、计算模拟和实验结果分析表明，无掩模激光干涉光刻和全息光刻具有大视场、高分辨率、无畸变、系统相对简单、成本较低，实现方便等特点，具有广阔的应用前景。