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投影物镜 meaning in Chinese

projection objective

Examples

  1. In initial result , line width of 0 . 75 u m was replicated on resist - coated wafer , and using more narrow mask imaging experiments are being carried out to find the imaging ability and the best focus position of the optics
    目前,利用更细线宽透射掩模的曝光复制实验正在进行中,以获得最小的复制线宽及schwarzschild微缩投影物镜的最佳焦面。
  2. The roughness of wyko and afm measuring are 0 . 73nm and 0 . 56nm in rms value respectively , in both primary and secondary mirrors , and will severity reduce the schwarzschlid optics throughput and the contrast of the image
    73urn ) sm , wyko检测结果)波纹度和高频段的0 56urn ( ms , afm捡测结果将严重影响schwarzschild微缩投影物镜的成像对比度和传输效率。
  3. The projection optics with aspherical mirror of sub - nanometer accuracy are required to get a resolution of less than 0 . 1 m m and wide exposure area simultaneously . the precision of polishing and testing for such ashperical surface is fairly high and it has not been achieved yet in our current state
    Euvl微缩投影物镜为了同时实现大的曝光视场和0 . 1 m以下的成像分辨率,微缩投影光学系统需采用面形精度达亚纳米量级的非球面,但我们现阶段的光学加工和检测技术距此要求尚有一定的差距。
  4. The primary and secondary mirrors of the schwarzschild optics were fabricated in our institute and measured using zygo mark iv interferometer . figure errors were observed in both primary and secondary mirror of 5nm ( rms ) . these magnitudes are very small at visible wavelength but sufficient to cause significant degradation in the wave - front quality of the schwarzschild optics in extreme ultraviolet ( euv ) wavelength
    利用zygomark干涉仪检测的schwarzschild微缩投影物镜主、次镜面形精度表明,对可见光工作波段已具有足够高的面形精度,均为5nm ( rms ) ,但在euv ( extremeultraviolet )波段,将给schwarzschild微缩投影物镜带来严重的波面误差。
  5. It might preferable , however , to use shperical mirror for the first step studies of euvl in a series investigation of system design , component fabrication , assembly technique and experimental process . along this thought , the author designed a schwarzschild optics using spherical mirrors with 10 : 1 reduction projection optics
    作为研究的第一步,出于进行euvl原理及系统设计、光学元件的制备、系统集成、掩模曝光实验等相关技术研究目的,采用球面schwarzschild微缩投影物镜是比较切实可行的技术方案。
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Related Words

  1. 固定焦距物镜
  2. 圆投影
  3. 投影显示
  4. 投影轮廓
  5. 投影直径
  6. 投影轨迹
  7. 双重投影
  8. 球形投影
  9. 矩形投影
  10. 球面投影
  11. 投影网
  12. 投影文件
  13. 投影系统
  14. 投影显示
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