投影光学 meaning in Chinese
projection optics
Examples
- Design of telecentric beam path for zoom projection optics
变焦距投影光学系统中的远心光路设计 - Being one of the key technologies of euvl , the alignment of optical lithography system affects directly the final imaging quality of the system
作为euvl关键技术之一，微缩投影光学系统的精密装调直接影响着系统的最终成像质量。 - If it is combined with high quality reduction projecting system , the fabrication of sub - micron diffractive optical elements can be realized completely
数字微镜如果结合高质量的高倍精缩投影光学系统，完全可实现亚微米级衍射微光学元件的制作。 - Finally , the schwarzschild objective of euvl is assembled and aligned on the common - axis illuminated structure with the wfe of 0 . 0202x ( a , = 632 . 8nm ) rms . using an off - axis circular subaperture of the full annular pupil , the wfe of the schwarzschild objective is 0 . 0144a , ( x = 632 . 8nm ) rms
最终对euvl系统中的schwarzschild微缩投影光学系统进行装调，验证了系统装调的收敛性，装调后系统的最终波像差为0 . 0144 rms ( = 632 . 8nm ) 。 - To validate this analysis and to obtain a more accurate characterization of the system , simulated alignments of the schwarzschild objective are performed . using bruning method , the two spherical mirrors of the schwarzschild objective are measured and the measurement accuracy is improved obviously
利用bruning绝对测量方法对euvl微缩投影光学系统的两个球面进行了高精度检测，检测的精度比用zygo干涉仪直接检测有明显的提高。