原子层沉积 meaning in Chinese

atomic layer deposition

Development in atomic layer deposition and its applications
原子层沉积技术及应用发展概况
Atomic layer deposition ( ald ) has attracted a lot of attention recently for its excellent deposition abilities , such as almost 100 % step coverage , accurate thickness control , large area uniformity , excellent process stability , and low processing temperatures
摘要最近原子层沉积( ald )吸引著许多的注意，原因在于它杰出的沉积技术能力，例如几乎100 %的阶梯覆盖、精准的薄膜厚度控制、大面积薄膜的均匀性、优异的制程稳定度与低温的制程。