刻蚀系统 meaning in Chinese
dry etchers system
Examples
- All these has provided us with scientific basis for designing the chamber of icp etching system and selecting the appropriate etching samples
这些结论为设计icp刻蚀系统的反应室、选择合适的刻蚀工艺提供了科学的根据。 - At present , feas have potential for use as an electron source in a wide variety of applications , including microwave power amplifiers ( such as twts , klystron ) , flat panel displays , electron microscopy , and electron beam lithography
目前,场致发射阵列阴极的应用领域十分广泛,主要包括微波器件(应用于twts , klystron等) 、平板显示器( feds ) 、电子显微镜及电子束刻蚀系统等。其中,应用研究的焦点主要集中在平板显示器和射频功率放大器。 - A set of icp etching system has been designed and manufactured through the analysis of the probe diagnosed results . during the study of the system , the emphasis is laid on the matching problem of icp coupled antenna via the rf matching device and rf power source
通过对探针诊断结果的分析，设计并制作一套icp刻蚀系统，重点研究icp耦合天线通过射频匹配器与射频功率源的匹配问题，得到很好的匹配效果，在射频输出功率为500w以内时，反射功率小于10w 。 - When the output power of the rf is within 500w and the reflection power is within 10w , a good matching effect can be gained . insb - in material in the icp etching system is etched by chc1f2 plasma . through the sem analysis of the etching result , it can be observed that the sidewall is smooth , flat and anisotropic
在自制的icp干法刻蚀系统中用chclf _ 2等离子体对insb - in材料实现了干法刻蚀，通过对刻蚀样品的sem分析，观察到刻蚀后的侧壁光滑平整，有良好的各向异性。