刻蚀深度 meaning in Chinese
etch depth
etched depth
Examples
- The reciprocal space map of x - ray difll - action for quantum - wires is simulated successfully . abundant structural intbrmation such as array period , geometric shape , etching depth and strain state , etc . for quantum wires are obtained
模拟了量于线x射线衍射的二三维图，得到更为丰富的样品结构信息，例如周期，形状，刻蚀深度，应变等。 - Besides of those , the pattern of the target is novel after the long time ' s erosion . there is no erosion ring on its surface , so we can use this method to improve the utilization rate greatly
更重要的是：此时靶面被刻蚀的状态比普通磁控溅射的要均匀得多，刻蚀深度值是从边缘到中间逐渐增大的，在靶面并没有出现通常的刻蚀环，因此这种磁控配置大大提高了靶的利用率。 - Through the analysis , it is shown that : 1 , while fabricating the grating , the principle of selecting the parameters is : the period should be as large as possible , the etching depth should be small and filling factor should approach to 0 . 25 . 2 , if selecting the parameter combine the selecting principle and the requirement of concrete application , the space of selecting the parameter should be larger than before . 3 , while the period to . 4a , , the surface profile has no effect on the reflectivity
通过分析发现： 1 、在制作有一定特性的光栅时，光栅参数的选择原则为：周期的取值应尽量的大，刻蚀深度的取值应尽量的小，占空比的取值应尽量靠近f = 0 . 25 ； 2 、以参数的选择原则结合制作的具体应用要求宋选择光栅的参数，则各个参数的优化空间更大； 3 、当光栅的周期t 0 . 4时，表面面形对反射率没有影响； 4 、运用临界周期点随折射率的变化规律，可以避免由于选择光栅周期过大而出现一级衍射，从而导致制作失败。