光阻剂 meaning in Chinese
duv
photoresist
Examples
- Positive acting resist
正型光阻剂 - The parts of the photoresist struck by the light can be selectively removed , exposing parts of the silicon wafer in a way that replicates the original pattern
光阻剂受光照射的部份可以选择性移除，因此在晶圆上露出原来图案复制的部份。 - However a novel electrolyte that can be used for gold electroplating and is suitable for formation of patterns on wafers in the application of electronics has been developed
由于亚硫酸系之镀金溶液能被应用于电子业中，不与光阻剂反应而能成形于矽晶元上。 - Now , many kind of 3d microstructure fabrications were developed , in which microlithography was changing characteristics in local area of photoresister , which illuminated uv light
延伸传统精密加工方法之微加工系统方法，其中之微影加工技术是利用紫外线光线照在光阻产生变化，使得显影作用于光阻剂的局部?围。 - A beam of light ( typically ultraviolet light from a mercury arc lamp ) shines through the chromium mask , then passes through a lens that focuses the image onto a photosensitive coating of organic polymer ( called the photoresist ) on the surface of a silicon wafer
一束光（通常是汞弧灯发出的紫外光）先穿透铬光罩，然后通过透镜把影像聚焦在晶圆表面的有机高分子感光涂料（称为光阻剂） 。