光电子发射 meaning in Chinese

photoelectron emission
photoelectronic emission

An atomic smictufal model for c ( 2x2 ) reconstruction is proposed and a total energy calculation illustrates that the hollow - site - occupied si adatom model might be a possible atomic structure of the c ( 2x2 ) reconstruction
光电子发射谱被用于研究界面形成过程中出zp 、 hf4f芯能级谱和价带谱，以及功函数等的变化。
The ultra - thin er layers with the thicanesses in the range of 0 . 5 ~ 3 monolayer ( ml ) are formed by electron beam evaporation on si ( 00l ) substrate at room temperature in an ultra - high vacuum system . after annealing at lower temperatures , ordered simcfores form on the surface . the trallsition of the surface reconsmiction pattem from ( 2 x l ) to ( 4 x 2 ) with the increase of er coverage up to l ml is observed by the reflective high energy electron diffraction ( rheed ) and low energy electron diffraction ( leed )
本文是关于硅( 001 )衬底与电子束淀积的铒、铪原子反应形成的超薄膜的界面与表面性质的研究，以及在该衬底上出现的共振光电子发射现象，包括了以下四个方面的工作： 1铒导致的硅( 001 )衬底上的( 4 2 )再构研究利用反射高能电子衍射和低能电子衍射，在室温淀积了0