交叉系数 meaning in Chinese

interaction coefficent

Through simulating the optical imaging system in lithography system , some ways to improve the lithography resolution and a convolution - based method to calculate light intensity are presented , and the calculating process of tcc ( transmission cross coefficient ) of optical system is introduced
摘要通过对光刻系统中光学成像系统的模拟，提出了改善光刻分辨率的途径以及基于卷积核的计算光强的方法，并介绍了光学系统的传输交叉系数具体计算过程。
The basics of lithography process , as well as the basic structure of lithographic system and the basic theory of partially coherent imaging are introduced in this paper . a bi - linear model of optical imaging is also presented . based on these theories , the simulation process of csplat is particularly analyzed , especially the computation of tccs ( transmission cross coefficient ) under different illuminations and the processing of primary lens aberrations inside tcc computation process
本文从光刻基本过程入手，介绍了光刻机光学系统的基本组成、部分相干光透射成像的基本原理，提出了光学系统的双线性模型，并在此基础上详细分析了仿真软件splat的仿真过程，其中着重分析了光学系统的传输交叉系数tcc的计算，包括不同照明系统下tcc的计算以及tcc计算中像差的处理。