nanolithography meaning in Chinese

毫微光刻

All this has laid a strong foundation for selecting a subject of maskless afm nanolithography , i . e . , field - induced oxidation of si semiconductor . in chapter two , a high - intensity current between a probe tip and a sample is discussed first . electrical intensity between them is simulated using matlab software after an electrical model is introduced , thus theoretically analyzing the effect of tip radii , tip - sample separation , radii at the sample , and biases on the morphology of field - induced oxidation
第二章首先讨论了扫描探针与样品之间的高密度电流，得出了电流密度与偏置电压和探针?样品间距密切相关，其关系不能以简单的线性或指数函数来表述的结论；然后引进了扫描探针场致加工的电场模型，利用matlab模拟探针与样品之间的电场强度，分析了扫描探针加工条件包括探针针尖曲率半径、探针-样品间距、样品平面半径以及偏置电压等对场致氧化物几何形态的影响。