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maskless meaning in Chinese

无屏蔽的
无掩模

Examples

  1. The prospect for the maskless lithography technology
    无掩模光刻技术的前景
  2. The beam division method in maskless laser interference photolithography can be divided into wave - front division and amplitude division
    摘要无掩模激光干涉光刻中的分束方法一般有波前分割和振幅分割。
  3. Simulation and experiments show that for point array or hole array patterns with the same sizes maskless interference photolithography is much simple than the traditional photolithography
    模拟和实验结果表明,对点阵或孔阵图形,在同样的图形尺度下,无掩模干涉光刻比传统光刻简单得多。
  4. Complex 3 - dimension ( 3d ) microstructures can be constructed using this technique with the advantages of being maskless , single step , real 3d structure and high resolution
    我们展示了一个有潜力应用于组织工程及生医领域之新颖的微制造技术双光子吸收光致聚合法,它所使用之基材为液态高分子材料。
  5. The basic principle , theory , main types and realizing methods of maskless laser interferometric lithographic technology used for generation of high resolution , deep sub - micron and nanometer patterns in large field of view are deeply investigated
    深入研究了无掩模激光干涉光刻技术用于高分辨、大视场、深亚微米和纳米图形生成的基本原理、理论、主要类型和实现方法。
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