| 1. | Blank detail specifications for pulsed magnetrons
脉冲磁控管空白详细规范 |
| 2. | Detail specification for pulse magnetron of type ckm - 6951
Ckm - 6951型脉冲磁控管详细规范 |
| 3. | Detail specification for pulsed magnetrons of type ckm - 29 series
Ckm - 29型系列脉冲磁控管详细规范 |
| 4. | Detail specification for frequency agility pulsed magnetron of type ckm - 709 709a
Ckm - 709 709a型捷变频脉冲磁控管详细规范 |
| 5. | Blank detail specification : pulsed magnetrons excluding frequency agile magnetrons ; german version en 136001 : 1992
空白详细规范.脉冲磁控管 |
| 6. | Specification for harmonized system of quality assessment for electronic components - blank detail specification : pulsed magnetrons excluding frequency agile magnetrons
电子元件器质量评定协调体系规范.脉冲磁腔管空白详细规范 |
| 7. | In the work , mid - frequency pulse magnetron sputtering is used to prepare znoral thin films used as the back reflector of the thin silicon films solar cells . the best techological condition was obtained by optimizing the preparing conditions , ( var is decided by the deposition rate , target voltage : 265v , gas pressure : 0 . 6pa , the high base vacuum is expected
本文采用中频脉冲磁控溅射法，通过优化zno ： al薄膜的制备工艺，如靶电压、本底真空度、工作气压、衬底温度、 o _ 2 ar ，得到可用于硅薄膜太阳能电池背电极的zno ： al薄膜。 |
