等离子源 meaning in English

plasma source

( 5 ) glassy oxide film of samples processed by mevva al / piid si covered the surface of sic coating thickly and uniformly , and left few holes as a result of a good ability of sealing , which made weight loss of sic - c / sic smaller in air at1300
( 5 ) mevva源注入al再piid (等离子源全方位沉积) si涂层，玻璃氧化层厚而均匀，愈合性能好，孔洞少，对涂层缺陷有最佳的改性效果。复合材料在1300空气中的氧化失重显著降低，甚至出现增重。
Diamond - like carbon gradient film on ti6a14v alloy substrate have been prepared by means of plasma source ion implanted - ion beam enhanced deposition ( psii - ibed ) . for potential applications as artificial joint materials and artificial cardiac valve materials , its trobological performance and hemocompatibility has also been evaluated in the present ph . d . thesis
本研究采用等离子源离子注入?离子束增强沉积技术( psii - ibed )制备了钛合金基类金刚石梯度薄膜材料，对类金刚石梯度薄膜这一新型人工关节材料和人工心脏瓣膜材料的生物摩擦学性能和血液相容性进行了研究和评价，研究了摩擦磨损对材料血液相容性的影响。