等离子体化学气相沉积 meaning in English
plasma activated chemical vapour deposition
plasma chemical vapour deposition
Examples
- In this work , cemented carbide ( wc - co ) was used as a kind of depositional substrate and diamond was deposited upon it in an mpcvd equipment
本研究中，用自行研制的微波等离子体化学气相沉积( mpcvd )装置对在硬质合金基体上金刚石的涂层进行了研究。 - Recently mwpcvd ( microwave plasmas chemical vapor deposition ) technique has attracted more and more attentions of the researchers all over the world , it is a new produce technique
近年来微波等离子体化学气相沉积技术越来越受到人们的关注,它是一种新型的生产技术。 - The research introduced a domestic microwave plasma chemical vapor deposition ( mpcvd ) equipment with a quartz glass window and watercooled stainless steel reaction chamber in 2450mhz / 5 kw
详细介绍了自行研制的2450mhz 5kw带有石英玻璃窗、水冷却不锈钢腔体微波等离子体化学气相沉积( mpcvd )装置。 - The research introduced a domestic microwave plasma chemical vapor deposition ( mpcvd ) equipment with a quartz glass window and water - cooled stainless steel reaction chamber in 2450mhz / 5 kw
本文详细介绍了自行研制的2450mhz 5kw带有石英玻璃窗、水冷却不锈钢腔体微波等离子体化学气相沉积( mpcvd )装置。 - In this investigation , gas barrier property of pet has been improved by plasma enhanced chemical vapor deposition ( pecvd ) and plasma immersion ion implantation ( piii ) technologies
本文通过等离子体化学气相沉积( pecvd )和等离体浸没离子注入( piii )技术在聚酯材料表面制备了阻隔碳膜来提高气体阻隔性能。