磁性层的 meaning in English

magnetospheric

The sputtering parameters of the tbco layer , such as sputtering power , sputtering pressure and sputtering time and the composition of the target , the thickness of the cr underlayer , all can influence the magnitude of the coercivity of tbco films . and the sputtering power , composition of the target and thickness of both layers exhibit strong affects . the optimal parameters cab be obtained from these results as follows , to tbco layer , pw = 375w , par = 4mt , t = 3min and to cr layer , pw = 250w , par = 4mt , t = 6min
溅射过程中， tbco磁性层的溅射工艺参数如溅射功率、复合靶的组分、溅射气压、溅射时间和cr底层的溅射气压及cr底层厚度对薄膜的矫顽力的大小都有影响，其中溅射功率、靶的组分及膜层厚度对矫顽力的影响较大；从实验结果得出tbco cr薄膜获得最大矫顽力的工艺参数如下： tbco层溅射功率pw = 375w ，溅射气压par = 4mt ，溅射时间t = 3min ； cr底层pw = 250w ，溅射气压par = 4mt ，溅射时间t = 6min 。